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Browse Prior Art Database

Reinforced Sputtering Target Structure

IP.com Disclosure Number: IPCOM000051343D
Original Publication Date: 1981-Jan-01
Included in the Prior Art Database: 2005-Feb-10
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Cistola, AB: AUTHOR [+3]

Abstract

In a sputtering target, the material to be sputtered is reinforced with an internal reinforcement web in addition to the conventional backing plate associated with such targets.

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Reinforced Sputtering Target Structure

In a sputtering target, the material to be sputtered is reinforced with an internal reinforcement web in addition to the conventional backing plate associated with such targets.

In one application, for example, the target is employed in the making of cermet resistors. In this application, the material is a composition of Cr/Cr(3)Si/SiO(2) (the SiO(2) being in quartz form) and the web i made of fused quartz fibers of high density crystalline form. During the sputtering processes as the material is being consumed from the target to form the cermet (CrSiO), the quartz (SiO(2)) of the web actively contributes as an ingredient in the formation of the cermet.

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