Browse Prior Art Database

Poly (N-Alkyl-O-Nitro Anilides)

IP.com Disclosure Number: IPCOM000051651D
Original Publication Date: 1981-Feb-01
Included in the Prior Art Database: 2005-Feb-10
Document File: 2 page(s) / 39K

Publishing Venue

IBM

Related People

Schierling, TD: AUTHOR [+2]

Abstract

We have prepared a new class of photosensitive polymers. These mater undergo structural changes when irradiated which can be exploited to provide lithographic relief images for printing, etch masks for microcircuit fabrication and/or as a contrast medium for optical information storage.

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Poly (N-Alkyl-O-Nitro Anilides)

We have prepared a new class of photosensitive polymers.

These mater undergo structural changes when irradiated which can be exploited to provide lithographic relief images for printing, etch masks for microcircuit fabrication and/or as a contrast medium for optical information storage.

The new materials contain n-alkyl-o-nitro aromatic amide linkages as their radiation-sensitive moiety. We have now incorporated this moiety into polymers. We have prepared polymers of the A-A, B-B type, and A-B polymers with the sensitive functionality can also be prepared. In the case of the A-A, B-B system, we have chosen to link the reactive functionality in the monomer through an arylether bond. However, alkyl substituents, sulfone groups, ester linkages, etc., could be employed. Alternatively, the polymerization could involve the forming of bonds other than those in the radiation-sensitive linkage.

A specific monomer was prepared from a known precursor (1) in the fashion shown below: See Original.

The new monomer II above was utilized to prepare two polymers through condensation polymerization with diacid chlorides. The condensations were conducted in DMA. The molecular weights correspond to DP=5- in various preparations. The meta linked polymer (III) is soluble in most common organic solvents. The para linked polymer (IV) is soluble in DMA, DMF, DMSO and TCE. See Original.

Polymers III and IV above were dissolved in organic solvents at concent...