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Sensitization of Diazo-Napthoquinone-Type Photoresists with Phenols

IP.com Disclosure Number: IPCOM000052040D
Original Publication Date: 1981-Apr-01
Included in the Prior Art Database: 2005-Feb-11
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Hiraoka, H: AUTHOR [+2]

Abstract

The sensitivity of diazo-naphthoquinone positive photoresists to electr beams is increased when certain phenols are incorporated. For example, the following phenols, when added to the resist (concentration of phenol: 2% by weight of the solid content of the resist) were found to exhibit the sensitivity enhancement: 2-cyanophenol 3-cyanophenol 4-cyanophenol 3,5-dimethylphenol 2,3-dihydroxynaphthalene 0-aminophenol m-aminophenol 4-hydroxybenzaldehyde.

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Sensitization of Diazo-Napthoquinone-Type Photoresists with Phenols

The sensitivity of diazo-naphthoquinone positive photoresists to electr beams is increased when certain phenols are incorporated. For example, the following phenols, when added to the resist (concentration of phenol: 2% by weight of the solid content of the resist) were found to exhibit the sensitivity enhancement: 2-cyanophenol

3-cyanophenol

4-cyanophenol

3,5-dimethylphenol

2,3-dihydroxynaphthalene

0-aminophenol

m-aminophenol

4-hydroxybenzaldehyde.

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