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Polymeric Donor Self Doped Acceptor Negative Resists

IP.com Disclosure Number: IPCOM000052087D
Original Publication Date: 1981-Apr-01
Included in the Prior Art Database: 2005-Feb-11
Document File: 2 page(s) / 22K

Publishing Venue

IBM

Related People

Hofer, DC: AUTHOR [+3]

Abstract

The novel lithographic properties of negative resist compositions composed of polymeric donor films doped with added halocarbon acceptor molecules have previously been described (Tj. Weighed amounts of halo-carbon compounds, such as CBr(4), were cospun with the polymer to form negative resists that are high sensitive, high contrast and high resolution materials. Described here is an additional approach to these kinds of resists in which the polymer material contains a donor group and an acceptor group, both covalently bonded to the polymer chain. This configuration has several advantages from a lithographic point of view, relative to the earlier two-component systems.

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Polymeric Donor Self Doped Acceptor Negative Resists

The novel lithographic properties of negative resist compositions composed of polymeric donor films doped with added halocarbon acceptor molecules have previously been described (Tj. Weighed amounts of halo-carbon compounds, such as CBr(4), were cospun with the polymer to form negative resists that are high sensitive, high contrast and high resolution materials. Described here is an additional approach to these kinds of resists in which the polymer material contains a donor group and an acceptor group, both covalently bonded to the polymer chain. This configuration has several advantages from a lithographic point of view, relative to the earlier two-component systems.

Polymeric donor-acceptor systems are easier to prepare because no weighing of the two components separately is required. In addition, because no monomeric component is required, it is likely that the film uniformity, and properties related to this, will be higher. The previously discussed two- component systems were UV-sensitive resists. This meant that whenever these films were handled for X-ray or E-beam exposures, the films had to be protected from actinic radiation. We have observed that the light sensitivity problem for as- spun wafers is much less severe for the one-component systems described herein (see below).

The one-component systems consist of copolymers which contain donor groups and halogenated acceptor groups on the same backbone. T...