Browse Prior Art Database

Screenable Alpha Particle Barrier

IP.com Disclosure Number: IPCOM000052119D
Original Publication Date: 1981-May-01
Included in the Prior Art Database: 2005-Feb-11
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Clark, RJ: AUTHOR [+2]

Abstract

Protection of silicon semiconductor devices from alpha particle emissio emanating from surrounding material is becoming increasingly important as the density of circuits increases and the size of circuit components decreases.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Screenable Alpha Particle Barrier

Protection of silicon semiconductor devices from alpha particle emissio emanating from surrounding material is becoming increasingly important as the density of circuits increases and the size of circuit components decreases.

A particularly good alpha particle barrier material has been found which is capable of being screened onto a substrate so as to form a screened pattern. This material is a polyimide resin having boron nitride particles added thereto. A particularly useful resin is du Pont's polyimide P12525 having added thereto boron nitride particles classified such that 98.5% pass through a 325 mesh screen.

The boron nitride particles, which are in the form of platelets, should be in a concentration of from about 20% to about 30% by weight of the P12525 and in which polyimide starting material there is from about 16% to about 28% solids.

In addition to the filler and alpha particle barrier characteristic of the boron nitride, it also acts as a thermally conducting material to increase heat transfer.

1