Browse Prior Art Database

Copolymer(Acrylonitrile Methacrylic) as All Dry Electron Beam

IP.com Disclosure Number: IPCOM000052256D
Original Publication Date: 1981-May-01
Included in the Prior Art Database: 2005-Feb-11
Document File: 2 page(s) / 45K

Publishing Venue

IBM

Related People

Czornyj, G: AUTHOR [+2]

Abstract

We have found that with the copolymer(acrylonitrile-methacrylic acid), the thermal fixing temperature can be as low as 100 degrees C or lower; yet, 1 x 10/-6/ C/cm/2/ patterns are clearly obtained. The T(g) for poly(acrylonitril) is reported to be 104 degrees, 130 degrees C; T(g) for poly(methacrylic acid) is about 170 degrees C.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 95% of the total text.

Page 1 of 2

Copolymer(Acrylonitrile Methacrylic) as All Dry Electron Beam

We have found that with the copolymer(acrylonitrile-methacrylic acid), the thermal fixing temperature can be as low as 100 degrees C or lower; yet, 1 x 10/- 6/ C/cm/2/ patterns are clearly obtained. The T(g) for poly(acrylonitril) is reported to be 104 degrees, 130 degrees C; T(g) for poly(methacrylic acid) is about 170 degrees C.

The lower temperature required for the engraved image formation enables us to have a higher resolution, and the high sensitivity of thermal developments enables us to modify the wall profiles of the resulting developed resist patterns by means of multiple layer techniques.

Our copolymer of acrylonitrile and methacrylic acid with the acrylonitrile content ranging from 40 to 60% yields thermally developed patterns even at 100 degrees C in air with a dosage of 1 x 10/-6/ C over cm/2/; the depth of the patterns can be as deep as 3 mum after thermal development as described later. Because of this high sensitivity and low temperature pattern developments, the copolymer of acrylonitrile and methacrylic acid is useful for mask makings.

The copolymer can be made photosensitive by the addition of photoactive compounds, particularly the triester of benzophenone and 1, 2- diazonaphthoquinone, and be treated either in a conventional wet development or in all-dry processes. Because the copolymer does not have any absorption longer than 2400 Angstroms, it is suited for deep UV-application....