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Browse Prior Art Database

Mask Cleaning Procedure

IP.com Disclosure Number: IPCOM000052311D
Original Publication Date: 1981-Jun-01
Included in the Prior Art Database: 2005-Feb-11
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Hecht, LC: AUTHOR

Abstract

A commercial material identified as DUREPOLY* is useful for cleaning glass masks used to manufacture semiconductors.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

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Mask Cleaning Procedure

A commercial material identified as DUREPOLY* is useful for cleaning glass masks used to manufacture semiconductors.

It is found that an optimum formulation consists of 25% DUREPOLY D6 and 75% DUREPOLY D5. * Trademark of Dureco Corporation, Boston, Mass.

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