Browse Prior Art Database

Pneumatic Chuck Transfer System

IP.com Disclosure Number: IPCOM000052334D
Original Publication Date: 1981-Jun-01
Included in the Prior Art Database: 2005-Feb-11
Document File: 2 page(s) / 29K

Publishing Venue

IBM

Related People

Cachon, RP: AUTHOR

Abstract

A pneumatic chuck transfer system for semiconductor wafers includes two wafer-holding chucks 1 and 2. The chucks are attached to a rotatable shaft 3 by arms 4 and 5, respectively. Shaft 3 is rotated to bring either chuck to a wafer load and unload position while the other chuck is moved into position for processing a semiconductor wafer such as to expose a layer of photoresist coated on the wafer. Pinion 6 is attached to shaft 3 and is rotated by moving rack 7. The reciprocal movement of rack 7 is accomplished using two air cylinders 8 and 9. Chamber B of cylinder 8 is connected to chamber B of cylinder 9 with a fix restrictor 10 in between. Air pressure to the cylinder chambers to cause reciprocation of rack 7 is controlled by electrically activated pneumatic valves 11 and 12.

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Pneumatic Chuck Transfer System

A pneumatic chuck transfer system for semiconductor wafers includes two wafer-holding chucks 1 and 2. The chucks are attached to a rotatable shaft 3 by arms 4 and 5, respectively. Shaft 3 is rotated to bring either chuck to a wafer load and unload position while the other chuck is moved into position for processing a semiconductor wafer such as to expose a layer of photoresist coated on the wafer. Pinion 6 is attached to shaft 3 and is rotated by moving rack 7. The reciprocal movement of rack 7 is accomplished using two air cylinders 8 and 9. Chamber B of cylinder 8 is connected to chamber B of cylinder 9 with a fix restrictor 10 in between. Air pressure to the cylinder chambers to cause reciprocation of rack 7 is controlled by electrically activated pneumatic valves 11 and 12. Two restrictors 13 are added near the valve out ports. The restrictor 10 provides a smooth and symmetrical motion of transfer. The system is not affected by the mass of the arm and chuck, and works smoothly even with only one chuck in place. The system is also not affected by a substantial change in air pressure.

By using commercially available restrictors, the system can be set for the appropriate speed of the transfer, and will never require any maintenance adjustment.

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