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Plasma Panel Margin Improvement

IP.com Disclosure Number: IPCOM000052376D
Original Publication Date: 1981-Jun-01
Included in the Prior Art Database: 2005-Feb-11
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Lorenzen, JA: AUTHOR

Abstract

The electrical operating margin of a plasma display panel is the diffe between the voltage at which the first cells ignite (V(max)) minus the voltage at which the first cells extinguish (V(min)). The panel margin generally decreases as the range of chamber gaps across the display area increases. Large gap areas cause V(min) to increase, while small gap areas cause V(max) to decrease. The panel margin also decreases with an increasing range of conductor line widths across the display area; i.e., narrow lines increase the V(min) and wide lines decrease V(max). In a conventional design, plasma panel operating margin is thus constrained by the variations in chamber gap and conductor line width.

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Plasma Panel Margin Improvement

The electrical operating margin of a plasma display panel is the diffe between the voltage at which the first cells ignite (V(max)) minus the voltage at which the first cells extinguish (V(min)). The panel margin generally decreases as the range of chamber gaps across the display area increases. Large gap areas cause V(min) to increase, while small gap areas cause V(max) to decrease. The panel margin also decreases with an increasing range of conductor line widths across the display area; i.e., narrow lines increase the V(min) and wide lines decrease V(max). In a conventional design, plasma panel operating margin is thus constrained by the variations in chamber gap and conductor line width.

The design approach of this article makes the effects of chamber gap and line width ranges compensate each other. Thus, the margin constraint due to natural chamber gap variation and line width variation is reduced. First, the dependence of V(max) on the gap must parallel the gap dependence of V(min.) One method to provide this relationship is to employ a gas mixture of 0.15% argon in neon. The second part of this design approach is to align small chamber gaps with narrow conductor lines and large chamber gaps with wide lines. For thin film conductor metallurgy deposited by an electron-beam evaporation technique, narrow conductor lines occur at the edges of the plate and gradually widen as they approach the center such that the widest lines occu...