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Browse Prior Art Database

Deposition of Thin Films

IP.com Disclosure Number: IPCOM000052418D
Original Publication Date: 1981-Jun-01
Included in the Prior Art Database: 2005-Feb-11
Document File: 2 page(s) / 26K

Publishing Venue

IBM

Related People

Lopez, JL: AUTHOR

Abstract

A method for depositing thin films on a substrate employs a magnetic field that is applied adjacent to a rotating platform 3 on which the substrate is positioned.

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Deposition of Thin Films

A method for depositing thin films on a substrate employs a magnetic field that is applied adjacent to a rotating platform 3 on which the substrate is positioned.

The magnetic field consists of two pairs of fixed Helmholtz coils that are disposed perpendicularly relative to each other. A current of magnitude A sin Omega t is applied to the first pair of coils 1, and a current of magnitude A cos Omega t is applied to the second pair of coils 2, where A = current amplitude, Omega = angular velocity, and t = time. The resultant magnetic field rotates at the angular velocity or frequency Omega and has a constant magnitude proportional to A. The substrate platform 3 also rotates at the frequency Omega so that the magnetic field vector will be effectively fixed in position relative to the platform. In this way, the magnetic material that is being deposited as a thin film is oriented in a desired direction.

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