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Selective Modification of Conductor Aspect Ratios

IP.com Disclosure Number: IPCOM000052720D
Original Publication Date: 1981-Jul-01
Included in the Prior Art Database: 2005-Feb-11
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Altimari, RJ: AUTHOR [+4]

Abstract

In conventional AC plasma display panel fabrication, conductor arrays are formed on a pair of glass plates, the individual conductors being disposed substantially orthogonal to each other, the conductors overcoated with a dielectric and a protective layer, sealed about their edges, and the resulting container filled with an ionizable gas. One of the methods of providing the conductor arrays is by bonding metallic conductors to the glass plate. However, in the large-size plasma display devices, metallic spacer elements are required within the display area to maintain a uniform discharge gap across the entire display surface.

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Selective Modification of Conductor Aspect Ratios

In conventional AC plasma display panel fabrication, conductor arrays are formed on a pair of glass plates, the individual conductors being disposed substantially orthogonal to each other, the conductors overcoated with a dielectric and a protective layer, sealed about their edges, and the resulting container filled with an ionizable gas. One of the methods of providing the conductor arrays is by bonding metallic conductors to the glass plate. However, in the large-size plasma display devices, metallic spacer elements are required within the display area to maintain a uniform discharge gap across the entire display surface. The electrical interaction between the spacer and adjacent conductors, particularly in panels of high resolution, produces a significant loss of margin (Vs(max)-Vs(min)) in cells adjacent to the spacer elements, which must be eliminated or compensated for. Spacers may also produce clusters of off cells adjacent the spacers, and such plasma panels are susceptible to premature aging. This margin loss can be at least partially regained by increasing the capacitance of cells adjacent to the spacer.

One of the methods of providing this compensation is by the use of a modified electrode design which involves increasing the width of lines in close proximity to the spacer. In order to minimize the effect of this change of cells on subsequent rows, it is necessary to proportionally alter the line pitch...