Browse Prior Art Database

Manufacture of Thin Film Magnetic Head

IP.com Disclosure Number: IPCOM000052979D
Original Publication Date: 1981-Aug-01
Included in the Prior Art Database: 2005-Feb-12
Document File: 2 page(s) / 23K

Publishing Venue

IBM

Related People

Gardner, RA: AUTHOR [+3]

Abstract

Alignment of thin film layers used as pole pieces in a magnetic head assembly is achieved with one set of element masks.

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Manufacture of Thin Film Magnetic Head

Alignment of thin film layers used as pole pieces in a magnetic head assembly is achieved with one set of element masks.

The process includes the steps of depositing the Pl and P2 thin film layers with an insulation layer I therebetween to serve as the transducing gap. Thereafter, an etch mask M, which may be made from titanium, for example, is deposited on the P2 layer. A photoresist layer R is applied, and the photoresist is exposed and developed to produce openings in the mask. The resist is removed, and the mask is etched by ion beam milling or reactive ion etching. The P2 insulating gap and P1 layer are etched through to the substrate surface
S. The mask is then stripped, and a protective overcoat layer 0 is deposited.

By this process, the Pl and P2 pole pieces are easily aligned and the wrap- around problem is eliminated. Also, final track width dimension are precisely controlled.

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