Dismiss
InnovationQ will be updated on Sunday, Oct. 22, from 10am ET - noon. You may experience brief service interruptions during that time.
Browse Prior Art Database

Process for the Fabrication of Deep Ultraviolet Variable Transmission Masks

IP.com Disclosure Number: IPCOM000053098D
Original Publication Date: 1981-Aug-01
Included in the Prior Art Database: 2005-Feb-12
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Fredericks, EC: AUTHOR [+4]

Abstract

This process describes the use of variable depth ion beam exposure to produce a mask pattern with selective transmission through quartz without a metal coating.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Process for the Fabrication of Deep Ultraviolet Variable Transmission Masks

This process describes the use of variable depth ion beam exposure to produce a mask pattern with selective transmission through quartz without a metal coating.

A polymer of photoresist film, with an optical density of 1.5 or greater, is patterned selectively to form compensating transmission as a function of line width.

This mask overcomes the loss of intensity in typical masks, due to diffraction effects especially in submicron geometries.

This is achieved by altering the thickness of the polymer/photo resist film remaining in the exposed portion of the mask by selection of the ion species and accelerating potential. This modulates the transmission of light in various line widths defined in the polymer/photo-resist film after development.

1