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Accelerated Gas Phase Laser Deposition of Noble Metals

IP.com Disclosure Number: IPCOM000059848D
Original Publication Date: 1986-Jan-01
Included in the Prior Art Database: 2005-Mar-08
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Baum, TH: AUTHOR [+3]

Abstract

Laser-induced deposition of copper and silver has recently been achieved. Metal deposition has been performed both photothermally and photochemically. By increasing the sample cell temperature to about 60ŒC, the vapor pressures of metal-contai solids are increased enough to enhance deposition rates dramatically. The effect has been demonstrated for deposition of copper by decomposition of Cu(hfac)2, and deposition of silver from Ag(tfac). The size of the rate increase is inversely proportional to the room-temperature rate itself, which in turn depends on the vapor pressure of the precursor compound. Copper deposition is slow at 25Œ but fast at 60, and silver deposition does not occur at room temperature but does at elevated temperatures. The properties of the deposited metals can be improved by annealing them.

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Accelerated Gas Phase Laser Deposition of Noble Metals

Laser-induced deposition of copper and silver has recently been achieved. Metal deposition has been performed both photothermally and photochemically. By increasing the sample cell temperature to about 60OEC, the vapor pressures of metal-contai solids are increased enough to enhance deposition rates dramatically. The effect has been demonstrated for deposition of copper by decomposition of Cu(hfac)2, and deposition of silver from Ag(tfac). The size of the rate increase is inversely proportional to the room-temperature rate itself, which in turn depends on the vapor pressure of the precursor compound. Copper deposition is slow at 25OE but fast at 60, and silver deposition does not occur at room temperature but does at elevated temperatures. The properties of the deposited metals can be improved by annealing them.

Disclosed anonymously.

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