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Browse Prior Art Database

Cleaning the Reaction Tube Prior to Open Tube Diffusions

IP.com Disclosure Number: IPCOM000060143D
Original Publication Date: 1986-Mar-01
Included in the Prior Art Database: 2005-Mar-08
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Malin, K: AUTHOR [+3]

Abstract

During the scavenging and heating-up cycle prior to open tube diffusion for doping semiconductor substrates, the conventionally used carrier gas is mixed with chlorine containing substances, such as HCl, Cl2, CCl4, CHCl3 or C2H3Cl3 . These substances form volatile compounds with dopant-containing residues precipitated during the preceding diffusion step on the wall of the reaction tube.

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Cleaning the Reaction Tube Prior to Open Tube Diffusions

During the scavenging and heating-up cycle prior to open tube diffusion for doping semiconductor substrates, the conventionally used carrier gas is mixed with chlorine containing substances, such as HCl, Cl2, CCl4, CHCl3 or C2H3Cl3
. These substances form volatile compounds with dopant-containing residues precipitated during the preceding diffusion step on the wall of the reaction tube.

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