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Automatic Inspection of Masks for Glass Substrates for the Production of Semiconductor Devices

IP.com Disclosure Number: IPCOM000060581D
Original Publication Date: 1986-Apr-01
Included in the Prior Art Database: 2005-Mar-08
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Dinkel, H: AUTHOR [+4]

Abstract

The measuring values of the photoelectrically scanned mask to be inspected are digitized and directly compared with computer-stored digital values. During scanning, the influence of long-term variations, in particular of the illuminating system or the gain factor of a video scanner, is taken into account to avoid undesired glare, as occurs when the illumination is readjusted. For scanning the transparent glass substrate or a portion thereof (not including mask regions), the illumination has to be readjusted to a particular percentage, say, 5%, of the scanning points having a value that is less than the saturation value. This reference value of 5% is used as a basis for mask scanning.

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Automatic Inspection of Masks for Glass Substrates for the Production of Semiconductor Devices

The measuring values of the photoelectrically scanned mask to be inspected are digitized and directly compared with computer-stored digital values. During scanning, the influence of long-term variations, in particular of the illuminating system or the gain factor of a video scanner, is taken into account to avoid undesired glare, as occurs when the illumination is readjusted. For scanning the transparent glass substrate or a portion thereof (not including mask regions), the illumination has to be readjusted to a particular percentage, say, 5%, of the scanning points having a value that is less than the saturation value. This reference value of 5% is used as a basis for mask scanning.

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