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Browse Prior Art Database

Heat Shielded And Telescopic Vaccum Pencil

IP.com Disclosure Number: IPCOM000060604D
Original Publication Date: 1986-Mar-01
Included in the Prior Art Database: 2005-Mar-08
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Gallagher, JP: AUTHOR [+2]

Abstract

A conventional vacuum pencil used to pick up semiconductor wafers is deficient in that it is of fixed length and does not protect the operator's hand from radiated heat. An invention proposes a telescoping tool which would incorporate a heat shield to eliminate those shortcomings.

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This is the abbreviated version, containing approximately 100% of the total text.

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Heat Shielded And Telescopic Vaccum Pencil

A conventional vacuum pencil used to pick up semiconductor wafers is deficient in that it is of fixed length and does not protect the operator's hand from radiated heat. An invention proposes a telescoping tool which would incorporate a heat shield to eliminate those shortcomings.

In wafer processing, the operator reaches the vacuum pencil down to pick up the wafer. Since the wafers are processed at ~350OEC, the tendency is to rush the task, which can lead to damaged wafers. Additionally, since the conventional tool is a fixed length, it can be awkward reaching for wafers farther in the processing chamber. The solution has been the vacuum pencil shown in the figure. A heat shield 1 is located forward of the handle 2. The tool telescopes 3 and may be conveniently adjusted as required.

A shorter transfer time and less damage is forseen with use of the new tool.

Disclosed anonymously.

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