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Laser Chemical Vapor Deposition of Silver

IP.com Disclosure Number: IPCOM000060619D
Original Publication Date: 1986-Mar-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Baum, TH: AUTHOR [+3]

Abstract

Silver deposition in a localized region is achieved by laser heating of a substrate surface in the localized region, with pyrolysis of a gas-phase coordination compound occurring at the heated surface. The inorganic precursor is silver trifluoroacetate, also known as "trifluoroacetic acid, silver salt". focusing a visible laser beam onto a sample mounted in a heated, evacuated cell containing only the vapor pressure of this commercially available solid, it is possible to form shiny meta deposits on silicon, silicon dioxide, and ceramic substrates. The silver compound is not air-sensitive, so that cell loading is unusually simple. So far, however, heating of the cell has been required to induce deposition. This requirement is presumably due to the low room-temperature vapor pressure of Ag(tfac).

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Laser Chemical Vapor Deposition of Silver

Silver deposition in a localized region is achieved by laser heating of a substrate surface in the localized region, with pyrolysis of a gas-phase coordination compound occurring at the heated surface. The inorganic precursor is silver trifluoroacetate, also known as "trifluoroacetic acid, silver salt". focusing a visible laser beam onto a sample mounted in a heated, evacuated cell containing only the vapor pressure of this commercially available solid, it is possible to form shiny meta deposits on silicon, silicon dioxide, and ceramic substrates. The silver compound is not air-sensitive, so that cell loading is unusually simple. So far, however, heating of the cell has been required to induce deposition. This requirement is presumably due to the low room- temperature vapor pressure of Ag(tfac).

The photothermal method of deposition described here is not limited to visible radiation; any light source that heats the substrate surface without being absorbed by the inorganic compound should produce the same results. This holds for visib infrared, and uv sources.

Disclosed anonymously.

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