Browse Prior Art Database

Hard Surface Mask for Plasma Display Photo/etching Process

IP.com Disclosure Number: IPCOM000060691D
Original Publication Date: 1986-Apr-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Griffith, JH: AUTHOR [+3]

Abstract

Hard surface mask in the form of chrome masks and polymer coated emulsion masks are known in the expose part of semiconductor photolithography. However, in masks of the size, dimension and line geometry required for large screen plasma display devices, for example, it is difficult to fabricate non-emulsion hard surface masks.

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Hard Surface Mask for Plasma Display Photo/etching Process

Hard surface mask in the form of chrome masks and polymer coated emulsion masks are known in the expose part of semiconductor photolithography. However, in masks of the size, dimension and line geometry required for large screen plasma display devices, for example, it is difficult to fabricate non-emulsion hard surface masks.

An improved process for fabricating large size non-emulsion hard surface masks is centered around chromium, but can be extended to other metallic surfaces, e.g., iron oxide. A mask size float glass coated with N 2000 ~ of optical grade chromium is coated with a positive photoresist. It is then exposed by proximity printing using a mirror image or regular emulsion mask. The image is developed and baked followed by a subsequent etch in KMnO4, ceric ammonium nitrate or other chromium etchant. If a mirror image is used, the product is a mask; if a regular emulsion is used, a second iteration results in a m

Disclosed anonymously.

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