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Browse Prior Art Database

Two-Terminal Active Matrix LCD Using Al2o3

IP.com Disclosure Number: IPCOM000060902D
Original Publication Date: 1986-May-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 2 page(s) / 72K

Publishing Venue

IBM

Related People

Campagna, FJ: AUTHOR [+2]

Abstract

Described is a lateral metal/insulator/metal ("MIM") capacitive element used in series with a liquid crystal display (LCD) picture element. The device uses aluminum and aluminum oxide to replace the tantalum and tantalum pentoxide films typically used in such devices. As shown in Fig. 1, of the drawing, the device comprises a substrate 1 of glass on which an insulating layer 2 is formed. A metal electrode 3, which has an insulating layer 4on top of it, is formed on the insulating layer 2. Another metal electrode 5 couples the aluminum electrode 3 to a transparent electrode 6 of the display. Fig. 2 shows the process steps for constructing the device shown in Fig. 1. Note that the substrate material can be soda lime glass rather than PYREX* because the disclosed fabrication process does not require high temperatures.

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Two-Terminal Active Matrix LCD Using Al2o3

Described is a lateral metal/insulator/metal ("MIM") capacitive element used in series with a liquid crystal display (LCD) picture element. The device uses aluminum and aluminum oxide to replace the tantalum and tantalum pentoxide films typically used in such devices. As shown in Fig. 1, of the drawing, the device comprises a substrate 1 of glass on which an insulating layer 2 is formed. A metal electrode 3, which has an insulating layer 4on top of it, is formed on the insulating layer 2. Another metal electrode 5 couples the aluminum electrode 3 to a transparent electrode 6 of the display. Fig. 2 shows the process steps for constructing the device shown in Fig. 1. Note that the substrate material can be soda lime glass rather than PYREX* because the disclosed fabrication process does not require high temperatures. The glass substrate 1 is first coated with a thick aluminum film 7 which is then wet anodized to form the insulation layer 2 of AlO. A second aluminum evaporation process, photolithographically defined, produces metal electrode 3. The edges and the top of electrode 3 are then anodized to form insulating layer 4. The thin indium-tin-oxide transparent electrode 6 is then formed. Finally, a third evaporated aluminum thin film 5 is deposited on the structure to complete the construction of the device. * Trademark of Corning Glass Works.

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