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Photomask Repair Process for Opaque Chrome Defects

IP.com Disclosure Number: IPCOM000061598D
Original Publication Date: 1986-Aug-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 2 page(s) / 44K

Publishing Venue

IBM

Related People

Sargent, RJ: AUTHOR

Abstract

A high resolution, low defect repair technique for multilevel chromium semiconductor photomasks is presented. Fig. 1 shows a chromium mask 10 on a glass substrate 11 with an opaque defect 12 in the chrome layer 13. As shown in Fig. 2, a thin organic film 14 is deposited on top of the chrome layer 13. An inorganic film 15 is then deposited, such as a chemical deposited oxide, followed by an overcoat of photoresist 16. Fig. 3 shows the photoresist layer 16 after being exposed and developed to create an opening 17 in the area of the opaque defect 12. This is done by exposing the photoresist to light from a source disposed below glass substrate 11. Fig. 4 shows the inorganic film 15 after reactive ion etched (RIE) through the photomask opening 17 to form an opening 18.

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Photomask Repair Process for Opaque Chrome Defects

A high resolution, low defect repair technique for multilevel chromium semiconductor photomasks is presented. Fig. 1 shows a chromium mask 10 on a glass substrate 11 with an opaque defect 12 in the chrome layer 13. As shown in Fig. 2, a thin organic film 14 is deposited on top of the chrome layer 13. An inorganic film 15 is then deposited, such as a chemical deposited oxide, followed by an overcoat of photoresist 16. Fig. 3 shows the photoresist layer 16 after being exposed and developed to create an opening 17 in the area of the opaque defect 12. This is done by exposing the photoresist to light from a source disposed below glass substrate 11. Fig. 4 shows the inorganic film 15 after reactive ion etched (RIE) through the photomask opening 17 to form an opening
18. The photoresist 16 is then removed simultaneously with forming an opening 19 in the organic film 14 by an oxygen RIE using the inorganic film 15 as a mask, as shown in Fig. 5. Thus, an opening is formed through the masking layers 14 and 15 to the opaque defect 12. Fig. 6 shows the chromium mask 10 after removal of the opaque defect 12 as well as the masking layers 14 and 15.

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