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Integrating Mask Registration and Critical Image Test Features Into a Common Diagnostics to Improve Mask Product Disposition

IP.com Disclosure Number: IPCOM000061723D
Original Publication Date: 1986-Sep-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 2 page(s) / 27K

Publishing Venue

IBM

Related People

Hsia, LC: AUTHOR [+4]

Abstract

A method has been proposed for improving the quality and efficiency of mask product disposition in semiconductor manufacturing processes. The new development proposes combining the mask critical image (MCI) and box-in-box targets into one structure. Under conventional techniques, conventional mask product disposition targets--box-in-box and MCI--are located in different areas of the cell kerf (Fig. 1). The mask dimensional quality disposition decision cannot be made until both diagnostic targets are measured on the appropriate number of cells within the array and then each of the two data file sets transferred to a programming language (APL) for analysis. This procedure is cumbersome requiring two separate measurement files, measurement of two different targets, and two different data file transfer operations. In Fig.

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Integrating Mask Registration and Critical Image Test Features Into a Common Diagnostics to Improve Mask Product Disposition

A method has been proposed for improving the quality and efficiency of mask product disposition in semiconductor manufacturing processes. The new development proposes combining the mask critical image (MCI) and box-in-box targets into one structure. Under conventional techniques, conventional mask product disposition targets--box-in-box and MCI--are located in different areas of the cell kerf (Fig. 1). The mask dimensional quality disposition decision cannot be made until both diagnostic targets are measured on the appropriate number of cells within the array and then each of the two data file sets transferred to a programming language (APL) for analysis. This procedure is cumbersome requiring two separate measurement files, measurement of two different targets, and two different data file transfer operations. In Fig. 1, the conventional box-in- box pattern 1 has only 3.0 mm lines 2. This pattern cannot be used for the MCI disposition on a product requiring 2.0 mm lines nor on one requiring 1.3 mm lines. In Fig. 2, the improved box-in-box pattern 3 contains lines 4, 5, 6 measuring 1.3 mm, 2.0 mm, and 5.0 mm, respectively. All spaces 2 are 3.0mm. This pattern may then be used for both registration and MCI verification with only one measurement and data transfer operation required. Mask dimensional disposition for registration and MCIs may be...