Browse Prior Art Database

Planetary Motion Fixture Plate for Thin Film Deposition

IP.com Disclosure Number: IPCOM000061818D
Original Publication Date: 1986-Sep-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 2 page(s) / 87K

Publishing Venue

IBM

Related People

Nowakowski, L: AUTHOR

Abstract

A mechanism has been developed to rotate semiconductor wafers during thin film deposition. This results in improved uniformity of the vaporized material which is being deposited on the wafers. In thin film deposition, the density of the vaporized material is not uniform across the fixture plate nor across the wafers resting in the plate. Because of this, most fixture plates in large evaporators are rotated. However, conventional units do not have the capability of rotating the individual wafer. This development which makes it possible to rotate the individual wafer while the fixture plate is rotating leads to a much improved uniformity of the evaporated coating deposited on the wafers. The planetary motion fixture plate is shown in a plan view in the figure.

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Planetary Motion Fixture Plate for Thin Film Deposition

A mechanism has been developed to rotate semiconductor wafers during thin film deposition. This results in improved uniformity of the vaporized material which is being deposited on the wafers. In thin film deposition, the density of the vaporized material is not uniform across the fixture plate nor across the wafers resting in the plate. Because of this, most fixture plates in large evaporators are rotated. However, conventional units do not have the capability of rotating the individual wafer. This development which makes it possible to rotate the individual wafer while the fixture plate is rotating leads to a much improved uniformity of the evaporated coating deposited on the wafers. The planetary motion fixture plate is shown in a plan view in the figure. Individual wafers 1 are held in the planetary motion wafer holder 2 by wafer-retaining clamps 3. The process reference wafer holder 4 is in the center of the fixture plate with an appropriate wafer orientation pin 5. A stationary drive pinwheel assembly 6 engages wafer holder drive sprockets 7 which are located immediately below the wafer holder 2. When the fixture plate is rotated, it imparts planetary and rotary motion to the wafer holders and thus to the wafers they contain. The axes of rotation of the individual wafer carriers is slightly non-parallel with respect to major axis of rotation of the fixture. The dual rotating aspect of the wafers leads ...