Browse Prior Art Database

Ion Milling With Argon And Hydrogen Mixture

IP.com Disclosure Number: IPCOM000061905D
Original Publication Date: 1986-Jul-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Campbell, RT: AUTHOR [+2]

Abstract

An ion milling process is described in which a mixture of argon and hydrogen is used which enables better control over the milling process.

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Ion Milling With Argon And Hydrogen Mixture

An ion milling process is described in which a mixture of argon and hydrogen is used which enables better control over the milling process.

A commonly used masking material for ion milling operations is photoresist. However, when milling reactive metals such as Cr, Ti, Ta, NiFe, etc. with argon ion bombardment, the milling rates of the photoresist masking material and/or the reactive metals may vary widely from run to run. It was found that the addition of about 5% hydrogen into the milling chamber produced consistent milling rates for both the photoresist material and the metal. The figure shows that the milling rate is a function of the ion beam incidence angle, so by choice of this angle and the introduction of hydrogen, a thinner layer of masking material can be used.

Disclosed anonymously.

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