Browse Prior Art Database

Exposure Site Cleaning for Glass Mask

IP.com Disclosure Number: IPCOM000062002D
Original Publication Date: 1986-Sep-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Doxsey, W: AUTHOR [+5]

Abstract

A modification to a glass mask tool photohead makes it possible to have a clean surface on the glass prior to subsequent processing. The proposal achieves the cleaning at the tim exposure, thereby eliminating the possibility of recontamination.

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Exposure Site Cleaning for Glass Mask

A modification to a glass mask tool photohead makes it possible to have a clean surface on the glass prior to subsequent processing. The proposal achieves the cleaning at the tim exposure, thereby eliminating the possibility of recontamination.

When processing a glass mask master it is essential to have a clean surface on the glass to prevent misprocessing. Prior methods involved blowing the glass off prior to placing in the tool. A clean surface at the exposure site was not always assured by this means.

The improvement to the photohead Fig. 1-1 was the addition of tubing 2 to provide a nitrogen blow-off adjacent to the lens 3 of the photohead. An appropriate flow line with regulator is connected to a nitrogen source. Nitrogen passed through the blow-off tubing impinges on the exposure site surface 4 cleaning it at the time of exposure. The reduction in rejects by this method results in an improvement in productivity.

Disclosed anonymously.

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