Browse Prior Art Database

Two-Position Device Allowing a Centrifugal Machine Spinning About a Vertical Axis to Be Automatically Loaded With Two Wafer Carriers

IP.com Disclosure Number: IPCOM000062120D
Original Publication Date: 1986-Oct-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 2 page(s) / 36K

Publishing Venue

IBM

Related People

Merly, JM: AUTHOR

Abstract

This device is provided to allow a centrifugal machine spinning about a vertical axis to be automatically loaded and unloaded with two wafer carriers, by means of a handling robot currently provided in highly efficient integrated circuit production lines. The operation will be understood by reference to Figs. 1-3. The spinning plate of the centrifugal machine is provided with two diametrically opposed rocking supports each one of them accommodating a wafer carrier. Each rocking support is provided with a steel balance weight to be protected with a protective layer that does not deteriorate. The supports freely rock about an horizontal pin which should never produce any particles. When the centrifugal machine is at rest, the balance weight is in low position and the wafers lay in a vertical plane in their carrier.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 71% of the total text.

Page 1 of 2

Two-Position Device Allowing a Centrifugal Machine Spinning About a Vertical Axis to Be Automatically Loaded With Two Wafer Carriers

This device is provided to allow a centrifugal machine spinning about a vertical axis to be automatically loaded and unloaded with two wafer carriers, by means of a handling robot currently provided in highly efficient integrated circuit production lines. The operation will be understood by reference to Figs. 1-3. The spinning plate of the centrifugal machine is provided with two diametrically opposed rocking supports each one of them accommodating a wafer carrier. Each rocking support is provided with a steel balance weight to be protected with a protective layer that does not deteriorate.

The supports freely rock about an horizontal pin which should never produce any particles. When the centrifugal machine is at rest, the balance weight is in low position and the wafers lay in a vertical plane in their carrier. When the spinning plate of the centrifugal machine starts to rotate, the balance weights pivot about their axis of rotation according to the ball governor principle. When the spinning plate rotates at its normal rotating speed (1000 rpm), the wafers lay in a horizontal plane. The wafer carriers are loaded into and unloaded from the centrifugal machine by the following means: 1. The centrifugal machine cover is provided with an automatic opening and closing system. 2. The robot arm is provided with a magnetic device (for ins...