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Laser Target Site Locator for Photoresist Development End-point Detect

IP.com Disclosure Number: IPCOM000062226D
Original Publication Date: 1986-Oct-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Peck, RC: AUTHOR

Abstract

A standard laser alignment tool is used before a production run in order to aid in the adjustment of a laser system used for photoresist development end-point detection.

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Laser Target Site Locator for Photoresist Development End-point Detect

A standard laser alignment tool is used before a production run in order to aid in the adjustment of a laser system used for photoresist development end-point detection.

In most semiconductor manufacturing environments, many different products are processed at the same time. Each product may have a different wafer site for photoresist development end-point detection. Because the end-point site on the conventional resist coated wafer is not visible for laser alignment purposes before development of the resist, a "target wafer" is used to aid in the alignment procedure.

The figure shows the top and side view of the "target wafer" as fabricated from stainless steel. The target wafer has the same diameter and thickness as the product wafers used in manufacturing. Apertures, the same diameter as the detector laser beam, fabricated in the target wafer at selected site locations for the various products for which photoresist development end-point detection is necessary.

The procedure is to align the laser to the selected aperture on the target wafer so that there is no reflected light. This can be verified visually or electronically by using the end-point detect system. After alignment is complete, the target wafer is removed from the end-point detector and the system is ready for developing product wafers.

The end-point detection system uses a red (non-exposing) light which is aimed at the product w...