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Browse Prior Art Database

Particle Removal And Analysis Method

IP.com Disclosure Number: IPCOM000062270D
Original Publication Date: 1986-Oct-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Cooper, DW: AUTHOR [+2]

Abstract

The removal of small, micron-size particles from a surface by an electric field can be accomplished more advantageously within a high-quality vacuum system.

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This is the abbreviated version, containing approximately 100% of the total text.

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Particle Removal And Analysis Method

The removal of small, micron-size particles from a surface by an electric field can be accomplished more advantageously within a high-quality vacuum system.

A structural arrangement within a vacuum chamber designed for particle removal and analysis is shown in the FIGURE. Conducting substrate 1 having particles 2 thereon is connected to DC power supply 3. The opposite polarity terminal of the power supply is connected to electrode 4. Monitoring the gap between substrate 1 and electrode 4 are a pair of light beam sources 5 with respective beam sensors 6 and an oscilloscope 7. The level of particle charge applied in a high-quality vacuum, such as one-millionth torr., can be increased to much higher values then at atmospheric pressure, and the process reduces particle adhesion while being compatible with electron beam charging techniq

Additionally, particle analysis can be performed by measuring properties of particle behavior. Particle velocity, mass a acceleration can be determined from charge changes at the electrode or by timing light beam interruption. Size, charge, adhesion force, coefficient of restitution, phase, and electrode surface character can also be deduced from various measurements. These data are important for cleaning and for prevention of particle release.

Disclosed anonymously.

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