Browse Prior Art Database

Method of Measuring Line Width

IP.com Disclosure Number: IPCOM000062273D
Original Publication Date: 1986-Nov-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 2 page(s) / 31K

Publishing Venue

IBM

Related People

Hsu, YS: AUTHOR

Abstract

This article relates generally to circuit line inspection and, more particularly, to a method of determining the width of circuit lines. Variations in circuit line widths can be simply determined from the nominal width values and voltage measurements without the necessity of constructing a van der Pauw pattern for finding sheet resistance. Referring to the figure, a circuit line extending between terminals 1 and 2 has nominal widths w or mw and lengths L or nL, where m and n are any positive numbers greater than one. When a current I is injected between terminals 1 and 2, voltage differences V1, V2 and V3 are measured between respective lands 3 and 4, 4 and 5, and 6 and 7.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Method of Measuring Line Width

This article relates generally to circuit line inspection and, more particularly, to a method of determining the width of circuit lines. Variations in circuit line widths can be simply determined from the nominal width values and voltage measurements without the necessity of constructing a van der Pauw pattern for finding sheet resistance. Referring to the figure, a circuit line extending between terminals 1 and 2 has nominal widths w or mw and lengths L or nL, where m and n are any positive numbers greater than one. When a current I is injected between terminals 1 and 2, voltage differences V1, V2 and V3 are measured between respective lands 3 and 4, 4 and 5, and 6 and 7. In a conventional four- terminal resistance bridge, line width w of the conducting layer is determined by

(Image Omitted)

where R is the sheet resistance of the conducting layer. Using this relation for the circuit in the figure, where nominal line width can vary by Ww due to overexposure, underexposure, overcut and undercut, then

(Image Omitted)

Since k can be obtained from measurement and n, m and w are known values from the circuit line mask design, Ww can be easily calculated. The final line width wf after processing is wf = w + Ww.

1

Page 2 of 2

2

[This page contains 2 pictures or other non-text objects]