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Device for Washing Gases

IP.com Disclosure Number: IPCOM000062390D
Original Publication Date: 1986-Nov-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 2 page(s) / 39K

Publishing Venue

IBM

Related People

Deseez, C: AUTHOR [+3]

Abstract

The purpose of this device is to wash toxic/corrosive gases coming out of furnaces and heavily doped with impurities, such as boron, phosphorus, and hydrochloric acid, after completion of the various thermal steps of a semiconductor process (diffusion, oxidation, etc.), the gases being subsequently ejected into the atmosphere after being cleaned and decontaminated. Referring to the figure, it can be seen that hot toxic gas goes into low body A of the gas washing device, through filtering elements B located on washing rings so that the duration of the exchange between the water coming through injector D and the gas is as long as possible. The gas having been cooled and washed, then goes into high body C and is expelled through conduit E into the atmosphere. Water is drained through connector J.

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Device for Washing Gases

The purpose of this device is to wash toxic/corrosive gases coming out of furnaces and heavily doped with impurities, such as boron, phosphorus, and hydrochloric acid, after completion of the various thermal steps of a semiconductor process (diffusion, oxidation, etc.), the gases being subsequently ejected into the atmosphere after being cleaned and decontaminated. Referring to the figure, it can be seen that hot toxic gas goes into low body A of the gas washing device, through filtering elements B located on washing rings so that the duration of the exchange between the water coming through injector D and the gas is as long as possible. The gas having been cooled and washed, then goes into high body C and is expelled through conduit E into the atmosphere. Water is drained through connector J. Connector F is used to drain condensation from conduit E. Connector G is used only as an HCl gas inlet, when this gas is purged from the gas system of the furnace without going through the process tube of the furnace. Conduit H is only used when the flow of expelled gas is liable to clog the drain trap and cause water to overflow. The interest of this gas washing device lies in the fact that it is well suited for use in carrying out all the processes. In fact, its large diameter enables it to receive a great quantity of gas without any pressure drop or reflow. In addition, the filtering elements B stacked on ring I, can be adapted for use in carryin...