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Browse Prior Art Database

Electron Beam Microscopy at One Atmosphere

IP.com Disclosure Number: IPCOM000062668D
Original Publication Date: 1986-Dec-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 2 page(s) / 36K

Publishing Venue

IBM

Related People

Batchelder, JS: AUTHOR

Abstract

A scanning electron microscope (SEM) can be used in a manner similar to an optical microscope by terminating the vacuum chamber of the scanning microscope before the electron beam reaches the sample. The electron beam is produced in the standard vacuum column and then made to pass through a window or slotted guide which encloses the vacuum chamber. Thus, the beam is propagated a distance in gas at standard temperature and pressure (STP) before impinging on the sample. The figure shows a cross-sectional view of the design of the objective chamber for this scanning electron microscope. The chamber 1 is terminated in a tapered cavity 2 consisting of side walls 3 and silicon supports 4. Between the silicon supports 4 is located a window or slotted guide 5 with a detector 6 surrounding the objective chamber.

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Electron Beam Microscopy at One Atmosphere

A scanning electron microscope (SEM) can be used in a manner similar to an optical microscope by terminating the vacuum chamber of the scanning microscope before the electron beam reaches the sample. The electron beam is produced in the standard vacuum column and then made to pass through a window or slotted guide which encloses the vacuum chamber. Thus, the beam is propagated a distance in gas at standard temperature and pressure (STP) before impinging on the sample. The figure shows a cross-sectional view of the design of the objective chamber for this scanning electron microscope. The chamber 1 is terminated in a tapered cavity 2 consisting of side walls 3 and silicon supports 4. Between the silicon supports 4 is located a window or slotted guide 5 with a detector 6 surrounding the objective chamber. Sample 7 is located beneath the beam focus but outside of the vacuum of the chamber. Typical working distance between the sample 7 and beam window 5 would be in the range of 0.1 to 1 mm for 5 KeV electrons. For the window 5 in the figure, the thinnest possible material is needed which will support atmospheric pressure and transmit electrons. With the small aperture design of the figure, the electron beam is rastered in only one direction and the sample is moved in the perpendicular direction in order to create an image. For example, a thin film of titanium can be supported by a thick, rigid substrate in which a long narro...