Browse Prior Art Database

Non-abrading Particle-free Mask Container

IP.com Disclosure Number: IPCOM000062781D
Original Publication Date: 1986-Dec-01
Included in the Prior Art Database: 2005-Mar-09
Document File: 1 page(s) / 13K

Publishing Venue

IBM

Related People

Bromley, CC: AUTHOR [+3]

Abstract

This article concerns a contamination-free container designed for the storage and loading of glass masks used in semiconductor and substrate manufacturing environments.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 52% of the total text.

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Non-abrading Particle-free Mask Container

This article concerns a contamination-free container designed for the storage and loading of glass masks used in semiconductor and substrate manufacturing environments.

The Figure shows a side cross-sectional view of the disclosed mask container. The container is human engineere allow for ease of mask insertion and removal, with a minimum of mask contact or ABRASION, and the technique employed in its design could be equally well applied to containers for the storage of wafers, metal masks, computer program disks, etc.

The conductive mask case shown is a dual-welled, hinged, sealed and latched container. While generally constructed to facilitate blow-molding technology, the design allows for other manufacturing techniques, including injection-molding, vacuum- forming, etc. via the use of insertable trays in a common or custom container, thus customizing for the item to be held therein. The base or bottom container 1 is manufactured such that the sealing face 2 is an inclined plane thereby allowing for ease of sealing with a contamination-free compressible seal 3 such as a closed cell irradiated polyethylene foam. A pocket 4 in either the top or bottom half retains the seal. Penetration rib(s) 5 compress on foam seal for sealing. Hinge 18, integral or mechanical, allows for swing of the cover away from the bottom 1. Minimal curved, forgiving clamp contact surfaces 7 allow for clamping vectors that hold the mask 8 downward against curved, forgiving minimal contact rest surfaces 9 and backwards against rear slot(s) 10. The mask is inclined from the vertical 11...