Browse Prior Art Database

Photosensitive Resists

IP.com Disclosure Number: IPCOM000072892D
Original Publication Date: 1970-Oct-01
Included in the Prior Art Database: 2005-Feb-22
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Peter, AE: AUTHOR

Abstract

The tackiness of some photosensitive resists, particularly unexposed Riston*, makes them convenient to use as selectively applied adhesives.

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Photosensitive Resists

The tackiness of some photosensitive resists, particularly unexposed Riston*, makes them convenient to use as selectively applied adhesives.

Usually, a photoresist can be heated to a point of tackiness without destroying its photosensitivity. It may, therefore, be applied as a heat sensitive adhesive over am entire surface, then selectively exposed to solubilize desired areas. These areas can be removed by the usual development techniques for the resist. Photoresist has the advantage of being removable along straight lines and not undercutting between adhered elements.

This method is particularly efficient in securing masks to conductive surfaces for subsequent electroplating. The resist at the open areas can be exposed and developed out after the mask is in place. * Trademark of E. I. du Pont de Nemours Company

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