Browse Prior Art Database

Photoresist Developer Compounds

IP.com Disclosure Number: IPCOM000073462D
Original Publication Date: 1970-Dec-01
Included in the Prior Art Database: 2005-Feb-22
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Grieco, MJ: AUTHOR [+5]

Abstract

Tetra-alkylammonium hydroxides are developer compounds for light-sensitive polymeric materials that form imaged patterns upon exposure and subsequent development.

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Photoresist Developer Compounds

Tetra-alkylammonium hydroxides are developer compounds for light- sensitive polymeric materials that form imaged patterns upon exposure and subsequent development.

Tetramethylammonium hydroxide aqueous and alcohol alkaline solutions of from 5% to 25% and having a pH range of 13 to 9 act as a sodium free developer for various commercial positive acting photo-resists. Substrate adherence is improved for application to semiconductor device processing.

These compounds are typical quarternary ammonium hydroxides of high alkalinity, thermally decomposable with little or no ash, and high dissociation constants.

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