Browse Prior Art Database

Immersion Development of Photoresists

IP.com Disclosure Number: IPCOM000073470D
Original Publication Date: 1970-Dec-01
Included in the Prior Art Database: 2005-Feb-22
Document File: 2 page(s) / 38K

Publishing Venue

IBM

Related People

Faigenbaum, MA: AUTHOR [+2]

Abstract

Photoresist developer system 1 contains plural immiscible fluid systems 2, 3. Upper fluid 2 is the developing medium and lower fluid 3 is composed to support an electrolysis process by which agitation bubbles 4 are released in planar formation from cathodic electrode 5 and transported through fluid 2 adjacent the developing part surface. A representative developer fluid is a solution of 1,1,1 trichloroethane. Fluid 3 may be composed of potassium carbonate in water.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Immersion Development of Photoresists

Photoresist developer system 1 contains plural immiscible fluid systems 2, 3. Upper fluid 2 is the developing medium and lower fluid 3 is composed to support an electrolysis process by which agitation bubbles 4 are released in planar formation from cathodic electrode 5 and transported through fluid 2 adjacent the developing part surface. A representative developer fluid is a solution of 1,1,1 trichloroethane. Fluid 3 may be composed of potassium carbonate in water.

In operation, a resist coated part 6 is immersed in fluid 2 after photoexposure. The resist coated surface 7 should be proximate and parallel to the path of the bubbles 4. Such positioning is secured by a guide frame suggested at 8. Voltage applied between electrodes 5 and 9, with indicated polarity, causes hydrogen bubbles 10 to form along knife edge 11 of electrode 5. The bubbles which rise in a generally planar formation adjacent resist coated surface 7 disperse the by-products of development which tend otherwise to congregate near the surface. Thus, fresh developer is continually circulated adjacent the surface.

1

Page 2 of 2

2

[This page contains 1 picture or other non-text object]