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Electropolymerization in Photoresist Technology

IP.com Disclosure Number: IPCOM000073552D
Original Publication Date: 1971-Jan-01
Included in the Prior Art Database: 2005-Feb-22
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Harvilchuck, JM: AUTHOR [+2]

Abstract

Electropolymerization (E.P.) refers to the initiation of a polymerization process by the passage of an electric current through a conductor into an ionized solution of the appropriate monomer.

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Electropolymerization in Photoresist Technology

Electropolymerization (E.P.) refers to the initiation of a polymerization process by the passage of an electric current through a conductor into an ionized solution of the appropriate monomer.

Extremely thin (100's of Angstroms) films of partially polymerized materials like poly-methyl methacrylate, poly-diacetoneacrylamide and numerous others so produced can be exposed by sufficiently energetic electromagnetic wavelengths, developed and postbaked to form pinhole-free, etchant resistant patterns. If a high energy source like an electron beam is used, direct selective volatization of these thin films is possible.

Unlike the conventional application of EP to protective coating formation, electropolymerization of films with occluded photosensitizer could allow long- wavelength-sensitive resist film formation.

Inherent to the involved mechanism, EP films are essentially pinhole-free. Applicability is likewise limited to metal films.

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