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Browse Prior Art Database

Anodized Photomask

IP.com Disclosure Number: IPCOM000074317D
Original Publication Date: 1971-Apr-01
Included in the Prior Art Database: 2005-Feb-23
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Hallen, RL: AUTHOR

Abstract

This metal-on-glass photomask technique provides sharp edge definition for semiconductor circuit applications.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

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Anodized Photomask

This metal-on-glass photomask technique provides sharp edge definition for semiconductor circuit applications.

A glass plate is first coated with a thin opaque film of an anodizable metal, such as aluminum. A photoresist image is applied and the metal is selectively anodized to form a mask pattern. The difference in optical density between the metal and the anodized areas provides sufficient contrast to give sharp edge definition yielding good line dimensions.

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