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Photoresist Polymer

IP.com Disclosure Number: IPCOM000074530D
Original Publication Date: 1971-May-01
Included in the Prior Art Database: 2005-Feb-23
Document File: 2 page(s) / 21K

Publishing Venue

IBM

Related People

Sonntag, F: AUTHOR

Abstract

A photoresist polymer is prepared by etherification of polyvinyl alcohol with either a hydroxycirnamic acid such as m- or p- coumaric acid or with a hydroxycinnamic acid ester, such as m- or p- coumaric esters. The structure of the polymers is: (Image Omitted)

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Photoresist Polymer

A photoresist polymer is prepared by etherification of polyvinyl alcohol with either a hydroxycirnamic acid such as m- or p- coumaric acid or with a hydroxycinnamic acid ester, such as m- or p- coumaric esters. The structure of the polymers is:

(Image Omitted)

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