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Browse Prior Art Database

Multilayer Optical Thickness Monitor

IP.com Disclosure Number: IPCOM000074559D
Original Publication Date: 1971-May-01
Included in the Prior Art Database: 2005-Feb-23
Document File: 2 page(s) / 47K

Publishing Venue

IBM

Related People

Esaki, L: AUTHOR [+2]

Abstract

When depositing extremely thin films (100A and less) of a material, prior thickness monitoring schemes are no longer adequate. A vacuum deposition system 1, shown schematically in the figure, is utilized to deposit thin films of desired materials on the surface of a substrate 2 which is held at a desired deposition temperature by a heater 3. Sources of material 4 and 5 are heated to a temperature sufficient to cause vaporization of the material and deposition on the surface of substrate 2. The deposition of films on substrate 2 is controlled by shutters 6 which can be actuated in such a way as to provide thin layers of different materials, or a thin layer of a mixture of the materials on substrate 2.

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Multilayer Optical Thickness Monitor

When depositing extremely thin films (100A and less) of a material, prior thickness monitoring schemes are no longer adequate. A vacuum deposition system 1, shown schematically in the figure, is utilized to deposit thin films of desired materials on the surface of a substrate 2 which is held at a desired deposition temperature by a heater 3. Sources of material 4 and 5 are heated to a temperature sufficient to cause vaporization of the material and deposition on the surface of substrate 2. The deposition of films on substrate 2 is controlled by shutters 6 which can be actuated in such a way as to provide thin layers of different materials, or a thin layer of a mixture of the materials on substrate 2. The thickness of the deposited layers is controlled by the use of a narrow-band interference filter 7 in cooperation with an optical system and a rotatable quartz monitor disc 8, a portion of which is subjected to the deposition of thin films via an aperture 9 at the same time deposition is being carried out on substrate 2. A light beam from a source 10 passes via an optical system and a window 11 through aperture 9. A light pipe 12 couples the light from source 10 through the deposited material and quartz disc 8 to a detector 13 via interference filter 7. Interference filter 7 selects a desirable wavelength region of operation. For maximum sensitivity this wavelength region should lie in the visible to near ultraviolet where the...