Browse Prior Art Database

Delineation of Semiconductor Junctions

IP.com Disclosure Number: IPCOM000074758D
Original Publication Date: 1971-Jun-01
Included in the Prior Art Database: 2005-Feb-23
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Lin, PT: AUTHOR

Abstract

In this method the delineation of junctions in semiconductors using the standard bevel & stain technique is greatly improved.

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Delineation of Semiconductor Junctions

In this method the delineation of junctions in semiconductors using the standard bevel & stain technique is greatly improved.

In the identification in semiconductor devices of PN junctions it is conventional to bevel the sample and subsequently stain it with chemicals such as Cu (NO(3))(2). In this technique the sample is further heated to approximately 160 degrees F and quenched. The additional treatment not only provides a better contrast between the opposite type impurity regions, but also delineates the N+ diffused region from the N- epi layer.

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