Browse Prior Art Database

Organic Dyed Thin Film Photomask

IP.com Disclosure Number: IPCOM000075151D
Original Publication Date: 1971-Aug-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Ilten, DF: AUTHOR [+5]

Abstract

Organic photomasks are made by imaging and developing a mixture of a light sensitive polymer and oil soluble azo type dyes.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Organic Dyed Thin Film Photomask

Organic photomasks are made by imaging and developing a mixture of a light sensitive polymer and oil soluble azo type dyes.

A solvent solution of a sensitive polymer, for example, polyvinylcinnamylidene acetate or m-cresol formaldehyde novolak resin containing a sensitizer is applied to a glass plate by any suitable technique, for example, spin coating to form a thin film. Conventional photolithographic techniques are employed to generate an image in the film. The image is then deand dyed by a conventional solvent developer for the polymer to which has been added a mixture of 20 grams/liter of SUDAN* I and 40 grams/liter of aniline yellow dyes. The resist film can also be dyed either before or after exposure and prior to development.

The finished masks have a sufficient optical density (O.D.) for use as photomasks and yet are semitransparent to facilitate visual alignment. For example, the SUDAN I - amber yellow dyed polyvinylcinnamylidene at a film thickness of 11000 Angstroms has an O.D. of greater than 2.0 at wavelengths below 4450 Angstroms. The spectral range is broadened by the use of other dyes, for example, oil yellow (N, N-dimethyl-p-phenylazoaniline), SUDAN red, SUDAN IV (Oil Red), and Solvent Black 7. * Trademark of Gheral Aniline & Film Corp.

1