Browse Prior Art Database

Relieved Cavity Resistor Paste Screening Mask

IP.com Disclosure Number: IPCOM000075158D
Original Publication Date: 1971-Aug-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 2 page(s) / 42K

Publishing Venue

IBM

Related People

Marks, D: AUTHOR [+2]

Abstract

A metal screening mask is constructed in such a manner as to allow the screening of resistor pastes of different ohmic values on a single substrate.

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Relieved Cavity Resistor Paste Screening Mask

A metal screening mask is constructed in such a manner as to allow the screening of resistor pastes of different ohmic values on a single substrate.

It is necessary when screening resistors on the substrate to sometimes screen pastes of different ohmic values. This must be performed in two separate operations. After the initial resistors are screened on the substrate, it is necessary to perform the second screening of resistors without damage to the first and to have the metal screen mask in as close contact with the substrate as possible.

By constructing the mask in the manner shown, a relief is created to allow clearance for the first resistor pads and to guarantee intimate contact of the mask to the substrate.

The bottom mask is created by etching completely through the bottom portion of the brazed assembly 1. Then a top mesh mash is fabricated by etching completely through the mask in the area 2 where paste is to be deposited, and allowing a relief 3 to be formed in the area of the initial screened resistors. The two masks are then brazed at 4 to form a single assembly 5.

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