Browse Prior Art Database

Inspection and Correction of Cr Cu Au Moly Masks

IP.com Disclosure Number: IPCOM000075168D
Original Publication Date: 1971-Aug-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 2 page(s) / 38K

Publishing Venue

IBM

Related People

Ross, T: AUTHOR

Abstract

Moly masks which are used to evaporate Cr-Cu-Au on devices are manufactured by chemical etching of the holes. In this process, some holes are not etched and the mask is rejected.

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Inspection and Correction of Cr Cu Au Moly Masks

Moly masks which are used to evaporate Cr-Cu-Au on devices are manufactured by chemical etching of the holes. In this process, some holes are not etched and the mask is rejected.

The holes which are not etched should be located and corrected. By using a template which has the same number of protrusions as the mask has holes, it can be determined through measurement if the holes are missing or blocked. This mask is then visually inspected and the blocked holes are located, and corrected by punching.

The templates are made for the top and bottom and the mask is placed between them. If the masks are good, a predetermined uniform thickness of the three pieces indicates the correct dimension (Fig. 1). If the mask has a missing hole, the thickness would be greater (Fig. 2).

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