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Double Sided Exposure Vacuum Chamber

IP.com Disclosure Number: IPCOM000075552D
Original Publication Date: 1971-Oct-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 2 page(s) / 30K

Publishing Venue

IBM

Related People

Giuffre, GJ: AUTHOR [+2]

Abstract

This exposure vacuum chamber provides precise alignment between a pair of glass photosensitive plates in an exposure process, which requires single-sided, double-sided and overlay images.

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Double Sided Exposure Vacuum Chamber

This exposure vacuum chamber provides precise alignment between a pair of glass photosensitive plates in an exposure process, which requires single- sided, double-sided and overlay images.

An upper chuck 1 is located on a fixed hinged mount, not shown.

A lower chuck 2 is located on a floating three-point spring suspension, with X, and Y + theta motion, not shown. An 0-ring 3 is used for separating the chucks 1 and 2, for separating a pair of glass photosensitized plates 4 and 5, and as a resilient spring means during the time when the photosensitive glass plates 4 and 5 are brought together in a total vacuum mode of operation. The 0-ring 3 also provides a vacuum seal for the two chucks 1 and 2.

Operatively, a vacuum is drawn at an opening 6 to hold the plates 4 and 5 in intimate contact with their associated chucks. This result is accomplished without the effect of the 0-ring 3. When the chucks 1 and 2 7, exists between them. The plates 4 and 5 thus are prevented from damaging each other due to spacing 7. The dimension of spacing 7 is critical, since it must allow the plates 4 and 5 to come into intimate contact when the complete vacuum is drawn during the collapse of 0-ring 3. That is, if spacing 7 is increased a small amount above the desired dimension, the chamber vacuum, combined with the atmospheric pressure on plate 4, overcomes the chuck vacuum existing at opening 6, and the upper plate 4 becomes disengaged from the upp...