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Diffusion Source Powder Confinement

IP.com Disclosure Number: IPCOM000075605D
Original Publication Date: 1971-Oct-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Kenney, DM: AUTHOR

Abstract

Dopant containing silicon powder used in closed capsule diffusions can be prevented from being deposited on surfaces by static charges and upon opening the capsule, by wetting the powder prior to use.

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Diffusion Source Powder Confinement

Dopant containing silicon powder used in closed capsule diffusions can be prevented from being deposited on surfaces by static charges and upon opening the capsule, by wetting the powder prior to use.

Spreading of finely powdered diffusion source material onto diffused wafers causes expensive handling and cleaning problems. These problems may be eliminated by wetting the source powder with deionized water, or some other highly pure, easily evaporated liquid, and then drying prior to diffusion. Although the powder is not soluble in the liquid, wetting and subsequent drying produces a tight packing or bonding of the powder to itself such that static charge no longer transfers particles from the bulk of the powder to nearby wafers. During subsequent opening of the capsule, the powder is also tightly enough bound to nearly eliminate movement of powder caused by the rush of air into the capsule.

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