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Browse Prior Art Database

Uniformity Deposition Corrector

IP.com Disclosure Number: IPCOM000075636D
Original Publication Date: 1971-Oct-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 2 page(s) / 35K

Publishing Venue

IBM

Related People

Wong, AC: AUTHOR

Abstract

An interceptor shutter is provided on a rotating dome-shaped substrate holder, to correct for variations in the thicknesses of the depositions made on semiconductor wafers.

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Uniformity Deposition Corrector

An interceptor shutter is provided on a rotating dome-shaped substrate holder, to correct for variations in the thicknesses of the depositions made on semiconductor wafers.

When a plurality of films are simultaneously evaporated on a wafer, the difference in wafer location causes a thickness nonuniformity. Wafers 1 on the inner ring of rotating dome 2 have a different thickness from wafers 3 on the outer ring. The thickness variation is a function of the projected radius r for dome
2.

To correct for the deposition nonuniformity, a blade 4 having the shape of a sector approximating 10% of a circle of radius r is mounted for rotation within the dome. Blade 4 is set at any desired angle rotating along the axis 0, 0', lying in the plane of the base circle of dome 2. As the dome rotates, blade 4 creates an effective blocking area from the evaporation source varying continuously from 0 to 10%, depending on the angle of rotation. The rotation of blade 4 is achieved by a conventional beveled gear mechanism with a rotary vacuum feedthrough. By varying the size of the sector of blade 4, any degree of deposition uniformity correction may be obtained.

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