Browse Prior Art Database

Pulse Orienting Wafer Load Unload System

IP.com Disclosure Number: IPCOM000075640D
Original Publication Date: 1971-Oct-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 2 page(s) / 65K

Publishing Venue

IBM

Related People

Appenzeller, HA: AUTHOR [+3]

Abstract

An automated load-unload system provides a means for handling light, flat round objects such as silicon wafers, without the need for mechanical transports or mechanisms.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 86% of the total text.

Page 1 of 2

Pulse Orienting Wafer Load Unload System

An automated load-unload system provides a means for handling light, flat round objects such as silicon wafers, without the need for mechanical transports or mechanisms.

Wafer 1 is moved along airslide 2 to preorienting station 3, where it is rotated by air jets and motor 4 until motor shaft 5 is located in notch 6. Gate 7 holds wafer 1 in position prior to loading wafer 1 on work station 8 for alignment and exposure with a photomask. To load wafer 1, gate 7 is opened and off-center air slots 9 in slide 2 cause wafer 1 to rotate against the lower edge of slide 2 and move to station 8, such that wafer 1 has rotated about 340 degrees from its original position when it arrives at station 8. Pulsed air from slots 10 in pedestal 11 is applied to the underside of wafer 1 to cause it to rotate about 20 degrees until locating pin 12 contacts notch 6. (Pulsed air allows wafer to rotate in small increments thereby preventing spinning and overshooting pin 12) Wafer 1 is now ready for fine alignment.

After exposure, wafer 1 is ejected onto slide 14 by the mechanism illustrated in Figs. 2 and 3. A set of eject rails 15 are drilled with directional air jets 17. Rails 15 are set into recesses 19 in pedestal 11. Guides 21 are raised by air cylinders 23 (Fig. 3). Mask base 25 is drilled with directional air jets 27. When the exposure has been completed, a solenoid valve causes a charge of air to enter chuck 29 and cylinders 23 which lifts...