Dismiss
InnovationQ will be updated on Sunday, Oct. 22, from 10am ET - noon. You may experience brief service interruptions during that time.
Browse Prior Art Database

Boron Paint On Diffusion Source for Low and High Surface Concentrations

IP.com Disclosure Number: IPCOM000075744D
Original Publication Date: 1971-Nov-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 2 page(s) / 22K

Publishing Venue

IBM

Related People

Beyer, KD: AUTHOR

Abstract

This "paint-on" diffusion source is stable and is not moisture sensitive as previous "paint-on" diffusion sources. As the dopant compound is a polymer, the dopant is not volatile up to temperatures of 300 degrees C. After diffusion from the boron "paint-on" source, high boron dopant concentration can be achieved in silicon without causing any pitting on silicon wafer surface.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Boron Paint On Diffusion Source for Low and High Surface Concentrations

This "paint-on" diffusion source is stable and is not moisture sensitive as previous "paint-on" diffusion sources. As the dopant compound is a polymer, the dopant is not volatile up to temperatures of 300 degrees C. After diffusion from the boron "paint-on" source, high boron dopant concentration can be achieved in silicon without causing any pitting on silicon wafer surface.

Polysiloxanes dissolved in organic solvents are mixed with siloxane compounds containing icosahedral carboranes of the following structure:

(Image Omitted)

These mixtures are spun on a silicon wafer on a photoresist spinner. After spinning, the boron "paint-on" diffusion source is decomposed in an oxidative ambient and boron doped SiO(2) - glass is formed. At elevated temperatures (900 degrees C-1200 degrees C) the boron diffusion is then performed.

1

Page 2 of 2

2

[This page contains 1 picture or other non-text object]