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Placing Masks into Contact

IP.com Disclosure Number: IPCOM000075849D
Original Publication Date: 1971-Nov-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 2 page(s) / 39K

Publishing Venue

IBM

Related People

Mallet, BR: AUTHOR [+2]

Abstract

This device provides a tight contact between a master mask 1 (or submaster Mask) and a working plate 2 disposed above the master mask.

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Placing Masks into Contact

This device provides a tight contact between a master mask 1 (or submaster Mask) and a working plate 2 disposed above the master mask.

A high vacuum is applied on the two opposite surfaces of the master mask 1 and the working plate 2 from a vacuum pump. This vacuum tends to ensure a tight contact between the two opposite surfaces. A rubber diaphragm 3, with a special shape, is placed on the working plate 2. Pressure P1, such as atmospheric pressure, is applied to this diaphragm in order to force working plate 2 against master mask 1. The diaphragm 3 has a slightly convex shape so that the pressure applied to the working plate does not involve any distortion.

The master mask 1 is held in position by suction applied through circular support 4 to avoid any sliding or distortion. A positive pressure P2, for example atmospheric pressure, is applied to the lower face of the master mask.

No distortion affects the master mask 1 and the working plate 2, due to the fact that all the stresses applied to them are symmetrical. This device ensures a better contact plane between the two masks, as well as a tighter contact.

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