Browse Prior Art Database

Chromium Master Mask

IP.com Disclosure Number: IPCOM000075976D
Original Publication Date: 1971-Dec-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Coquard, JA: AUTHOR [+2]

Abstract

The use of a chromium master mask, instead of an emulsion type master mask, enables the number of steps required to fabricate masks to be reduced and to obtain a master mask with a longer service life and a better dimensional control of the image size.

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Chromium Master Mask

The use of a chromium master mask, instead of an emulsion type master mask, enables the number of steps required to fabricate masks to be reduced and to obtain a master mask with a longer service life and a better dimensional control of the image size.

Conventional mask technology uses the following scheme for the fabrication of a working plates: master mask of the emulsion type, then submaster mask of the emulsion type and, last, working plate which can be either of the emulsion type or made of chromium. The use of a chromium master mask allows this scheme to be reduced as follows: chromium master mask and working plate of the emulsion type or made of chromium.

Should the photoresist used for fabricating masks, be a positive photoresist, the image of the master mask will have to be "reverse-positive" to obtain a "direct-positive" chromium working plate, and "reverse-negative" to obtain a "direct-positive" working plate or the emulsion type.

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